Additional Technical References

Chapter 20:   Preparation for Tapeout

Mask Manufacture

  1. Melville, D., et al., "Demonstrating the Benefits of Source-Mask Optimization and Enabling Technologies through Experiment and Simulations", Proceedings of the SPIE, Vol. 7640, 2010.

  2. Lafferty, N., et al., "RET Selection on state-of-the-art NAND flash", Proceeding of the SPIE, Vol. 9426, 2015.

  3. Lafferty, N., et al., "Full-Flow RET Creation, Comparison, and Selection", Proceedings of the SPIE, Vol. 9235, 2014.

© 2019 by Thomas Dillinger